The RTD Wafer temperature measurement system integrates RTD sensors onto the wafer surface using independently developed core technologies, enabling real-time monitoring and recording of temperature change data during the wafer manufacturing process. It provides an efficient and reliable method for monitoring and optimizing key process parameters in semiconductor manufacturing. With strong anti-interference capability, it can work normally in dry etching environments to accurately monitor etching process temperatures, and precisely measure process temperatures in high-temperature environments.
Wafer Size | 2", 3", 4", 6", 8", 12" | Temperature Sensing Element | RTD |
---|---|---|---|
Number of Temperature Measurement Points | 1-45 | Wafer Material | Silicon Wafer/Sapphire, etc. |
Temperature Range | -40-250°C (-40-15°C; 15-250°C) | Communication Mode | Wireless Communication Transmission |
Temperature Accuracy | ±0.5°C | Sampling Frequency | 1Hz/2Hz |
Sensor-to-Sensor Deviation | <0.5°C | Supporting Host | Temperature Measurement System Host |
Temperature Measurement Software | Specialized software for real-time display of temperature field profiles and heating curves |